Oberflachenanalytische Charakterisierung Von Metallischen Verunreinigungen Und Oxiden Auf GAAS

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Der Autor entwickelt ein Verfahren zum quantitativen Nachweis von metallischen Spurenelementen, das es moeglich macht, Oberflachenbelegungen auf GaAs mit sehr geringen Konzentrationen quantitativ nachzuweisen.