CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Format
Hardback
Publisher
Materials Research Society
Country
United States
Published
19 November 2009
Pages
194
ISBN
9781605111285

CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

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