Low Energy Ion Beam and Plasma Modification of Materials: Volume 223

Featuring 55 papers from the 1991 MRS Spring Meeting (April 29 - May 3, Anaheim, California), this volume shows the wide range of materials which can be modified advantageously by low energy particles from ion beam and plasma sources. Topics covered include: fundamentals of ion-material interactions; microwave ion sources for deposition and etching; processing of high-Tc thin films and interfaces; electronic materials - III-V compounds; electronic compounds - silicon and Si-Ge; ion processing of oxides, nitrides, polymers and carbon; ion processing of metals.