Nanolithography and Implications on Circuit Design

Format
Hardback
Publisher
Springer-Verlag New York Inc.
Country
United States
Published
1 November 2012
Pages
400
ISBN
9781441961563

Nanolithography and Implications on Circuit Design

This book provides a comprehensive and updated ‘state-of-the-art’ compilation on nanolithography and implications on future nanometer IC designs. Its scope in a bottom-up manner, includes the underlying equipment and process issues for nanolithography, the computational lithography aspects, and the key design and CAD issues and possible solutions. The subjects covered include: introduction of nanolithography process and trends; computational lithography (including lithography simulations, OPC, inverse lithography, pixilated mask, source mask optimization, etc.); lithography-aware analysis & design; and, future lithography technologies and EDA impact.

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