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Part 1: Introduction and Overview 1. Overview and Evolution of Silicon Wafer Cleaning Technology 2. Overview of Wafer Contamination and Defectivity Part 2: Wet-Chemical Processe s 3. Particle Deposition and Adhesion 4. Aqueo us Cleaning and Surface Conditioning Processes Part 3: Dry Cleaning Processes 5. Gas-phase Wafer Cleaning Technology6. Plasma Stripping and Cleaning 7. Cryogenic A erosols and Supercritical Fluid Cleaning Part 4: Analytical and Control Aspects 8. Detection and Measurement of Partic ulate Contaminants 9. Surface Chemical Composition and Morp hology 10. Ultratrace Impurity and Surface Morphology Analy sis 11. Analysis and Control of Electrically Active Contami nants Part 5: Directions for the Near Future
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Part 1: Introduction and Overview 1. Overview and Evolution of Silicon Wafer Cleaning Technology 2. Overview of Wafer Contamination and Defectivity Part 2: Wet-Chemical Processe s 3. Particle Deposition and Adhesion 4. Aqueo us Cleaning and Surface Conditioning Processes Part 3: Dry Cleaning Processes 5. Gas-phase Wafer Cleaning Technology6. Plasma Stripping and Cleaning 7. Cryogenic A erosols and Supercritical Fluid Cleaning Part 4: Analytical and Control Aspects 8. Detection and Measurement of Partic ulate Contaminants 9. Surface Chemical Composition and Morp hology 10. Ultratrace Impurity and Surface Morphology Analy sis 11. Analysis and Control of Electrically Active Contami nants Part 5: Directions for the Near Future