Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Contents include: The Blanket Tungsten Approach The Selective Tungsten Approach Blanket vs. Selective Tungsten Tungsten as Interconnect Material The Chemistry of CVD-W and Properties of Tungsten The Deposition Equipment Miscellaneous CVD of Tungsten Silicide.