A seminal work in mask design, this book provides a detailed examination of the principles and techniques involved in creating effective masks. This includes an overview of materials, design concepts, and practical considerations. With stunning photography and insightful descriptions, this book is essential reading for designers and artists alike.

This work has been selected by scholars as being culturally important, and is part of the knowledge base of civilization as we know it.

This work is in the "public domain in the United States of America, and possibly other nations. Within the United States, you may freely copy and distribute this work, as no entity (individual or corporate) has a copyright on the body of the work.

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